A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology

MLA

Cacciato, A., et al. “A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology.” Electrochemical and Solid State Letters, vol. 14, no. 7, July 2011. EBSCOhost, https://doi.org/10.1149/1.3579240.

APA

Cacciato, A., Breuil, L., Dekker, H., Zahid, M., Kar, G. S., Everaert, J. L., Schoofs, G., Shi, X., Van den bosch, G., Jurczak, M., Debusschere, I., Van Houdt, J., Cockburn, A., Date, L., Xa, L.-Q., Le, M., & Lee, W. (2011). A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology. Electrochemical and Solid State Letters, 14(7). https://doi.org/10.1149/1.3579240

Chicago

Cacciato, A., L. Breuil, H. Dekker, M. Zahid, G. S. Kar, J.L. Everaert, G. Schoofs, et al. 2011. “A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology.” Electrochemical and Solid State Letters 14 (7). doi:10.1149/1.3579240.