Cite
The Bias Temperature Instability Characteristics of In Situ Nitrogen Incorporated ZrOxNyGate Dielectrics
MLA
Jung, Hyung-Suk, et al. “The Bias Temperature Instability Characteristics of In Situ Nitrogen Incorporated ZrOxNyGate Dielectrics.” Electrochemical and Solid State Letters, vol. 13, no. 9, Sept. 2010. EBSCOhost, https://doi.org/10.1149/1.3456518.
APA
Jung, H.-S., Park, J.-M., Kim, H. K., Kim, J. H., Won, S.-J., Lee, J., Lee, S. Y., Hwang, C. S., Kim, W.-H., Song, M.-W., Lee, N.-I., & Cho, D.-Y. (2010). The Bias Temperature Instability Characteristics of In Situ Nitrogen Incorporated ZrOxNyGate Dielectrics. Electrochemical and Solid State Letters, 13(9). https://doi.org/10.1149/1.3456518
Chicago
Jung, Hyung-Suk, Jung-Min Park, Hyo Kyeom Kim, Jeong Hwan Kim, Seok-Jun Won, Joohwi Lee, Sang Young Lee, et al. 2010. “The Bias Temperature Instability Characteristics of In Situ Nitrogen Incorporated ZrOxNyGate Dielectrics.” Electrochemical and Solid State Letters 13 (9). doi:10.1149/1.3456518.