Cite
Observation of Self-limiting Regime in the Atomic Layer Deposition of ZnO Films using Nitrous Oxide as the Oxygen Supply
MLA
Chung, Ping-Han, et al. “Observation of Self-Limiting Regime in the Atomic Layer Deposition of ZnO Films Using Nitrous Oxide as the Oxygen Supply.” ECS Transactions, vol. 19, no. 3, May 2009. EBSCOhost, https://doi.org/10.1149/1.3120698.
APA
Chung, P.-H., Lai, H.-W., Lin, Y.-T., Yen, K.-Y., Kung, C.-Y., & Gong, J.-R. (2009). Observation of Self-limiting Regime in the Atomic Layer Deposition of ZnO Films using Nitrous Oxide as the Oxygen Supply. ECS Transactions, 19(3). https://doi.org/10.1149/1.3120698
Chicago
Chung, Ping-Han, Hung-Wei Lai, Yen-Ting Lin, Kuo-Yi Yen, Chung-Yuan Kung, and Jyh-Rong Gong. 2009. “Observation of Self-Limiting Regime in the Atomic Layer Deposition of ZnO Films Using Nitrous Oxide as the Oxygen Supply.” ECS Transactions 19 (3). doi:10.1149/1.3120698.