Photolysis versus Photothermolysis of N2O on a Semiconductor Surface Revealed by Nonadiabatic Molecular Dynamics

Identifying photolysis and photothermolysis during a photochemical reaction has remained challenging because of the highly non-equilibrium and ultrafast nature of the processes. Using state-of-the-art ab initio adiabatic and nonadiabatic molecular dynamics, we investigate N2O photodissociation on the reduced rutile TiO2(110) surface and establish its detailed mechanism. The photodecomposition is initiated by electron injection, leading to the formation of a N2O–ion-radical, and activation of the N2O bending and symmetric stretching vibrations. Photothermolysis governs the N2O dissociation when N2O–is short-lived. The dissociation is activated by a combination of the anionic excited state evolution and local heating. A thermal fluctuation drives the molecular acceptor level below the TiO2band edge, stabilizes the N2O–anion radical, and causes dissociation on a 1 ps timescale. As the N2O–resonance lifetime increases, photolysis becomes dominant since evolution in the anionic excited state activates the bending and symmetric stretching of N2O, inducing the dissociation. The photodecomposition occurs more easily when N2O is bonded to TiO2through the O rather than N atom. We demonstrate further that a thermal dissociation of N2O can be realized by a rational choice of metal dopants, which enhance p–dorbital hybridization, facilitate electron transfer, and break N2O spontaneously. By investigating the charge dynamics and lifetime, we provide a fundamental atomistic understanding of the competition and synergy between the photocatalytic and photothermocatalytic dissociation of N2O and demonstrate how N2O reduction can be controlled by light irradiation, adsorption configuration, and dopants, enabling the design of high-performance transition-metal oxide catalysts.