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Depth of focus in high-NA EUV lithography: a simulation study
- Source :
- Proceedings of SPIE; December 2022, Vol. 12293 Issue: 1 p122930V-122930V-13, 12170084p
- Publication Year :
- 2022
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12293
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs61458832
- Full Text :
- https://doi.org/10.1117/12.2642695