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Nanoimprint performance improvements for high volume semiconductor device manufacturing

Authors :
Kasprowicz, Bryan S.
Liang, Ted
Ifuku, Toshihiro
Hiura, Mitsuru
Takabayashi, Yukio
Kimura, Atsushi
Suzaki, Yoshio
Ito, Toshiki
Yamamoto, Kiyohito
Choi, Byung Jin
Estrada, Teresa
Resnick, Douglas J.
Source :
Proceedings of SPIE; December 2022, Vol. 12293 Issue: 1 p122930E-122930E-10, 12170081p
Publication Year :
2022

Details

Language :
English
ISSN :
0277786X
Volume :
12293
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs61458816
Full Text :
https://doi.org/10.1117/12.2643212