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Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE

Authors :
Itani, Toshiro
Naulleau, Patrick P.
Gargini, Paolo A.
Ronse, Kurt G.
Anunciado, Roy
Lee, Jisun
Barzegar, Ellaheh
van der Sanden, Stefan
Schelcher, Guillaume
Schoofs, Stijn
Source :
Proceedings of SPIE; December 2022, Vol. 12292 Issue: 1 p122920J-122920J-8, 1106289p
Publication Year :
2022

Details

Language :
English
ISSN :
0277786X
Volume :
12292
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs61446126
Full Text :
https://doi.org/10.1117/12.2637772