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Semi-custom methodology to fabricate transmission electron microscopy chip for in situcharacterization of nanodevices and nanomaterials

Authors :
Yu, BoCheng
Sun, Mei
Pan, RuHao
Tian, JiaMin
Zheng, FengYi
Huang, Dong
Lyu, FengJiao
Zhang, ZhiTong
Li, JunJie
Chen, Qing
Li, ZhiHong
Source :
SCIENCE CHINA Technological Sciences; April 2022, Vol. 65 Issue: 4 p817-825, 9p
Publication Year :
2022

Abstract

The fabrication of nanodevices on the delicate membrane window of the TEM (transmission electron microscopy) chip has the risk of breakage failure, limiting in-depth research in this area. This work proposed a methodology to address this issue, enabling secure in-situtransmission electron microscopic observation of many devices and materials that would otherwise be difficult to achieve. Combining semi-custom TEM chip design and front-side protected release technology, a variety of nanodevices were successfully fabricated onto the window membrane of the TEM chip and studied in situ.Moreover, the pressure tolerance of window membrane was investigated and enhanced with a reinforcing structure. As an example of typical applications, MoS2devices on the TEM chip have been fabricated and electron beam-induced gate modulation and irradiation damage effects, have been demonstrated.

Details

Language :
English
ISSN :
16747321 and 18691900
Volume :
65
Issue :
4
Database :
Supplemental Index
Journal :
SCIENCE CHINA Technological Sciences
Publication Type :
Periodical
Accession number :
ejs59171001
Full Text :
https://doi.org/10.1007/s11431-021-1980-1