A New Approach of E-beam Proximity Effect Correction for High-Resolution Applications

MLA

Simecek, Michal, et al. “A New Approach of E-Beam Proximity Effect Correction for High-Resolution Applications.” Japanese Journal of Applied Physics, vol. 37, no. 12, Dec. 1998, p. 6774. EBSCOhost, https://doi.org/10.1143/JJAP.37.6774.

APA

Simecek, M., Rosenbusch, A., Ohta, T., & Jinbo, H. (1998). A New Approach of E-beam Proximity Effect Correction for High-Resolution Applications. Japanese Journal of Applied Physics, 37(12), 6774. https://doi.org/10.1143/JJAP.37.6774

Chicago

Simecek, Michal, Anja Rosenbusch, Tsuneaki Ohta, and Hideyuki Jinbo. 1998. “A New Approach of E-Beam Proximity Effect Correction for High-Resolution Applications.” Japanese Journal of Applied Physics 37 (12): 6774. doi:10.1143/JJAP.37.6774.