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Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit

Authors :
Tuda, Mutumi
Ono, Kouichi
Masakazu Taki, Masakazu Taki
Keisuke Namba, Keisuke Namba
Source :
Japanese Journal of Applied Physics; March 1994, Vol. 33 Issue: 3 p1530-1530, 1p
Publication Year :
1994

Abstract

A new-type electron-cyclotron-resonance (ECR) plasma source has been developed for materials processing. The reactor employed magnetic multicusp fields and microwaves radially injected through an annular slit; this configuration yielded stable, uniform discharges without contamination of the microwave entrance window by sputtered particles. Electrostatic probe and optical emission measurements were made to obtain the plasma properties in Ar. These measurements showed that high-density, uniform plasmas were produced by optimizing the width of the annular slit. Moreover, the electron temperature exhibited its strong peak around the ECR zone near the chamber wall. A simple model indicates the mechanisms responsible for the plasma uniformity obtained: the plasma was dominantly produced around the ECR zone, and then diffused preferentially toward the center of the chamber because of strong magnetic fields generated near the wall surface.

Details

Language :
English
ISSN :
00214922 and 13474065
Volume :
33
Issue :
3
Database :
Supplemental Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Periodical
Accession number :
ejs56125480
Full Text :
https://doi.org/10.1143/JJAP.33.1530