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Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit
- Source :
- Japanese Journal of Applied Physics; March 1994, Vol. 33 Issue: 3 p1530-1530, 1p
- Publication Year :
- 1994
-
Abstract
- A new-type electron-cyclotron-resonance (ECR) plasma source has been developed for materials processing. The reactor employed magnetic multicusp fields and microwaves radially injected through an annular slit; this configuration yielded stable, uniform discharges without contamination of the microwave entrance window by sputtered particles. Electrostatic probe and optical emission measurements were made to obtain the plasma properties in Ar. These measurements showed that high-density, uniform plasmas were produced by optimizing the width of the annular slit. Moreover, the electron temperature exhibited its strong peak around the ECR zone near the chamber wall. A simple model indicates the mechanisms responsible for the plasma uniformity obtained: the plasma was dominantly produced around the ECR zone, and then diffused preferentially toward the center of the chamber because of strong magnetic fields generated near the wall surface.
Details
- Language :
- English
- ISSN :
- 00214922 and 13474065
- Volume :
- 33
- Issue :
- 3
- Database :
- Supplemental Index
- Journal :
- Japanese Journal of Applied Physics
- Publication Type :
- Periodical
- Accession number :
- ejs56125480
- Full Text :
- https://doi.org/10.1143/JJAP.33.1530