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Fabrication Process and Properties of Nb-InSb-Nb Planar Junction

Authors :
Hato, Tsunehiro
Akaike, Hiroyuki
Yoshiaki Takai, Yoshiaki Takai
Hisao Hayakawa, Hisao Hayakawa
Source :
Japanese Journal of Applied Physics; April 1992, Vol. 31 Issue: 4 p1039-1039, 1p
Publication Year :
1992

Abstract

A Nb-InSb-Nb planar junction with a normal layer of InSb thin film was fabricated by a new process. In this report, the details of the fabrication process and properties of the junction are discussed. The Nb-InSb-Nb junction fabricated using the new process showed a supercurrent. This means that there is no notable barrier, such as the Schottky barrier at the interface between Nb and InSb. The InSb film has a mobility of 500?700 cm2/V·s, which is 17?23 times larger than that of Si. This makes it possible to realize the superconductor-semiconductor-superconductor junction with a low carrier density of 1017cm-3.

Details

Language :
English
ISSN :
00214922 and 13474065
Volume :
31
Issue :
4
Database :
Supplemental Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Periodical
Accession number :
ejs56115995
Full Text :
https://doi.org/10.1143/JJAP.31.1039