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Fabrication of High Quality NbN/Pb Josephson Junction
- Source :
- Japanese Journal of Applied Physics; January 1980, Vol. 19 Issue: 1 p591-591, 1p
- Publication Year :
- 1980
-
Abstract
- A fabrication technology of NbN/Pb Josephson tunnel junctions has been developed by using a new microfabrication technique. The Josephson characteristics of NbN/Pb tunnel junctions formed on rf reactive sputtered NbN films are reported. The junctions are found to have large gaps (?NbN+?Pb=3.8 mV), low leakage, and to be quite stable with respect to thermal cyclings and storage at room temperature.
Details
- Language :
- English
- ISSN :
- 00214922 and 13474065
- Volume :
- 19
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Japanese Journal of Applied Physics
- Publication Type :
- Periodical
- Accession number :
- ejs56098787
- Full Text :
- https://doi.org/10.7567/JJAPS.19S1.591