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Fabrication of High Quality NbN/Pb Josephson Junction

Authors :
Shinoki, Fujitoshi
Takada, Susumu
Kosaka, Shin
Hayakawa, Hisao
Source :
Japanese Journal of Applied Physics; January 1980, Vol. 19 Issue: 1 p591-591, 1p
Publication Year :
1980

Abstract

A fabrication technology of NbN/Pb Josephson tunnel junctions has been developed by using a new microfabrication technique. The Josephson characteristics of NbN/Pb tunnel junctions formed on rf reactive sputtered NbN films are reported. The junctions are found to have large gaps (?NbN+?Pb=3.8 mV), low leakage, and to be quite stable with respect to thermal cyclings and storage at room temperature.

Details

Language :
English
ISSN :
00214922 and 13474065
Volume :
19
Issue :
1
Database :
Supplemental Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Periodical
Accession number :
ejs56098787
Full Text :
https://doi.org/10.7567/JJAPS.19S1.591