28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

Authors :: Felix, Nelson M.
Lio, Anna
De Simone, D.
Kljucar, L.
Das, P.
Blanc, R.
Beral, C.
Severi, J.
Vandenbroeck, N.
Foubert, P.
Charley, A.
Oak, A.
Xu, D.
Gillijns, W.
Mitard, J.
Tokei, Z.
van der Veen, M.
Heylen, N.
Teugels, L.
Le, Q. T.
Schleicher, F.
Leray, P.
Ronse, K.
Kim, Il Hwan
Kim, Insung
Park, Changmin
Lee, Jisun
Ryu, Koungmin
De Schepper, P.
Doise, J.
Kocsis, M.
Source :: Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116090Q-116090Q-11, 11492922p
Publication Year :: 2021

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