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Extending 0.33 NA EUVL to 28 nm pitch using alternative mask and controlled aberrations
- Source :
- Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116090T-116090T-16, 11492927p
- Publication Year :
- 2021
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 11609
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs56046151
- Full Text :
- https://doi.org/10.1117/12.2583800