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Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture

Authors :
Wan, Ye
Guo, Wenhui
Xiao, Jin
Yan, Dazhou
Zhao, Xiong
Guo, Shuhu
Liu, Jianhua
Zhong, Qifan
Yang, Tao
Zhao, Yu
Chang, Xin
Gao, Xin
Source :
Chinese Journal of Chemical Engineering; September 2020, Vol. 28 Issue: 9 p2248-2255, 8p
Publication Year :
2020

Abstract

Ultra-high-purity silicon tetrachloride (SiCl4) is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry. The high requirement for ultra-high-purity SiCl4has created the need for a high-efficient process for reducing energy consumption as well as satisfying product quality. In this paper, a mass of production technology of ultra-high-purity SiCl4was successfully developed through chlorination reaction in the ultraviolet (UV)-based photo microreactor coupled with the distillation process. The influences of key operational parameters, including temperature, pressure, UV wavelength and light intensity on the product quality, especially for hydrogen-containing impurities, were quantified by the infrared transmittance of Fourier transform infrared spectroscopy (FT-IR) at 2185 cm−1and 2160 cm−1indicating that characteristic vibrational modes of SiH bonds, as well as the operating conditions of distillation were also investigated as key factors for metal impurities removing. The advanced intensification of SiCl4manufactured by the integration of photo microreactor and distillation achieves the products with superior specifications higher than the standard commercial products.

Details

Language :
English
ISSN :
10049541
Volume :
28
Issue :
9
Database :
Supplemental Index
Journal :
Chinese Journal of Chemical Engineering
Publication Type :
Periodical
Accession number :
ejs53612713
Full Text :
https://doi.org/10.1016/j.cjche.2020.06.023