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Laser micro annealing conditioning for the suppression of statistical scatter in freestanding Sb2Te3nanowire resistance

Authors :
Mikulics, M.
Lu, J.G.
Huang, L.
Tse, P.L.
Zhang, J.Z.
Mayer, J.
Hardtdegen, H.
Source :
FlatChem; May 2020, Vol. 21 Issue: 1
Publication Year :
2020

Details

Language :
English
ISSN :
24522627
Volume :
21
Issue :
1
Database :
Supplemental Index
Journal :
FlatChem
Publication Type :
Periodical
Accession number :
ejs52876163
Full Text :
https://doi.org/10.1016/j.flatc.2020.100164