Residue-Free Dry Etching of Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication

MLA

Takagahara, Kazuhiko, et al. “Residue-Free Dry Etching of Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication.” ECS Transactions, vol. 50, no. 12, Mar. 2013, pp. 435–40. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edo&AN=ejs52645602&authtype=sso&custid=ns315887.

APA

Takagahara, K., Ono, K., Kuwabara, K., Sakata, T., Ishii, H., Sato, Y., & Jin, Y. (2013). Residue-Free Dry Etching of Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication. ECS Transactions, 50(12), 435–440.

Chicago

Takagahara, Kazuhiko, Kazuyoshi Ono, Kei Kuwabara, Tomomi Sakata, Hiromu Ishii, Yasuhiro Sato, and Yoshito Jin. 2013. “Residue-Free Dry Etching of Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication.” ECS Transactions 50 (12): 435–40. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edo&AN=ejs52645602&authtype=sso&custid=ns315887.