Back to Search
Start Over
Model-based proximity effect correction for helium ion beam lithography
- Source :
- Proceedings of SPIE; March 2018, Vol. 10584 Issue: 1 p105841C-105841C-12, 10478272p
- Publication Year :
- 2018
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 10584
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs46021795
- Full Text :
- https://doi.org/10.1117/12.2297691