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Impact of aberrations in EUV lithography: metal to via edge placement control

Authors :
Goldberg, Kenneth A.
Felix, Nelson M.
Yin, Lianghong
Raghunathan, Ananthan
Fenger, Germain
Shang, Shumay
Lafferty, Neal
Sturtevant, John
Source :
Proceedings of SPIE; March 2018, Vol. 10583 Issue: 1 p105830Q-105830Q-10, 10477181p
Publication Year :
2018

Details

Language :
English
ISSN :
0277786X
Volume :
10583
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs45579794
Full Text :
https://doi.org/10.1117/12.2299872