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Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

Authors :
Takehisa, Kiwamu
Ochiai, Shunsuke
Takayama, Tomohiro
Kishimura, Yukiko
Asada, Hironori
Sonoda, Manae
Iwakuma, Minako
Hoshino, Ryoichi
Source :
Proceedings of SPIE; July 2017, Vol. 10454 Issue: 1 p1045414-1045414-6
Publication Year :
2017

Details

Language :
English
ISSN :
0277786X
Volume :
10454
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs43124672
Full Text :
https://doi.org/10.1117/12.2279079