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Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

Authors :
Kasprowicz, Bryan S.
Buck, Peter D.
Takei, Satoshi
Sugino, Naoto
Kameda, Takao
Nakajima, Shinya
Hanabata, Makoto
Source :
Proceedings of SPIE; October 2016, Vol. 9985 Issue: 1 p99852C-99852C-7, 898676p
Publication Year :
2016

Details

Language :
English
ISSN :
0277786X
Volume :
9985
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs40743201
Full Text :
https://doi.org/10.1117/12.2243401