Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)

MLA

Kasprowicz, Bryan S., et al. “Prototyping 9-Inch Size PSM Mask Blanks for 450mm Wafer Process (2016).” Proceedings of SPIE, vol. 9985, no. 1, Oct. 2016, p. 99851H–99851H–4. EBSCOhost, https://doi.org/10.1117/12.2241378.

APA

Kasprowicz, B. S., Buck, P. D., Harashima, N., Iso, H., & Chishima, T. (2016). Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016). Proceedings of SPIE, 9985(1), 99851H–99851H–4. https://doi.org/10.1117/12.2241378

Chicago

Kasprowicz, Bryan S., Peter D. Buck, Noriyuki Harashima, Hiroyuki Iso, and Tatsuya Chishima. 2016. “Prototyping 9-Inch Size PSM Mask Blanks for 450mm Wafer Process (2016).” Proceedings of SPIE 9985 (1): 99851H–99851H–4. doi:10.1117/12.2241378.