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Reaction Mechanism Studies on the Atomic Layer Deposition of Zr<INF>x</INF><INF></INF>Ti<INF>y</INF><INF></INF>O<INF>z</INF><INF></INF> Using the Novel Metal Halide−Metal Alkoxide Approach

Authors :
Rahtu, A.
Ritala, M.
Source :
Langmuir; December 2002, Vol. 18 Issue: 25 p10046-10048, 3p
Publication Year :
2002

Details

Language :
English
ISSN :
07437463 and 15205827
Volume :
18
Issue :
25
Database :
Supplemental Index
Journal :
Langmuir
Publication Type :
Periodical
Accession number :
ejs3997554
Full Text :
https://doi.org/10.1021/la026357t