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mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
- Source :
- Proceedings of SPIE; March 2016, Vol. 9779 Issue: 1 p977925-977925-13
- Publication Year :
- 2016
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 9779
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs39173650
- Full Text :
- https://doi.org/10.1117/12.2219165