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Formation and Stabilization of Mesostructured Vanadium-Oxo-Based Hybrid Thin Films

Authors :
Crepaldi, E. L.
Grosso, D.
Soler-Illia, G. J. A. A.
Albouy, P.-A.
Amenitsch, H.
Sanchez, C.
Source :
Chemistry of Materials; August 2002, Vol. 14 Issue: 8 p3316-3325, 10p
Publication Year :
2002

Abstract

Mesostructured vanadium-oxo-based hybrid thin films have been prepared by evaporation-induced self-assembly. Anhydrous metal chlorides (VOCl<INF>3</INF> or VCl<INF>4</INF>) were used as the vanadium source, and the nonionic surfactant Brij 56 or 58 was used as the structure-directing agent in ethanol/water solutions. Mesostructured films were obtained from solutions having V(IV)/V<INF>total</INF> ratios higher than 0.7, evidencing the role of V(IV) in the formation of a curved inorganic VO<INF>x</INF><INF></INF>-based (2 ≤ x ≤ 2.15) framework. The hybrids obtained are fragile and water-sensitive, so that deposition and all of the processing leading to stabilization of the mesostructure must be performed at low relative humidity. A combination of synchrotron-SAXS and interferometry was applied to evaluate the structural evolution related to the evaporation process during dip-coating. The SAXS data clearly showed a 2D hexagonal structure (P6m space group, a = 65−80 Å) that is converted to a 2D centered rectangular (C2m space group) through preferential contraction in the direction normal to the substrate. The structure of the hybrid films is stable up to 250 °C in inert atmosphere.

Details

Language :
English
ISSN :
08974756
Volume :
14
Issue :
8
Database :
Supplemental Index
Journal :
Chemistry of Materials
Publication Type :
Periodical
Accession number :
ejs3635667
Full Text :
https://doi.org/10.1021/cm021151z