Back to Search Start Over

20nm CMP model calibration with optimized metrology data and CMP model applications

Authors :
Sturtevant, John L.
Capodieci, Luigi
Katakamsetty, Ushasree
Koli, Dinesh
Yeo, Sky
Hui, Colin
Ghulghazaryan, Ruben
Aytuna, Burak
Wilson, Jeff
Source :
Proceedings of SPIE; March 2015, Vol. 9427 Issue: 1 p94270U-94270U-9, 848440p
Publication Year :
2015

Details

Language :
English
ISSN :
0277786X
Volume :
9427
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs35679858
Full Text :
https://doi.org/10.1117/12.2085728