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Scatterometry-based metrology for the 14nm node double patterning lithography
- Source :
- Proceedings of SPIE; March 2015, Vol. 9424 Issue: 1 p942410-942410-11
- Publication Year :
- 2015
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 9424
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs35679459
- Full Text :
- https://doi.org/10.1117/12.2085775