Back to Search Start Over

Diffusion in thin bilayer films during rapid thermal annealing

Authors :
Grieseler, Rolf
Au, Ivan S.
Kups, Thomas
Schaaf, Peter
Source :
Physica Status Solidi (A) - Applications and Materials Science; November 2014, Vol. 211 Issue: 11 p2635-2644, 10p
Publication Year :
2014

Details

Language :
English
ISSN :
18626300 and 18626319
Volume :
211
Issue :
11
Database :
Supplemental Index
Journal :
Physica Status Solidi (A) - Applications and Materials Science
Publication Type :
Periodical
Accession number :
ejs34098887
Full Text :
https://doi.org/10.1002/pssa.201431039