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3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?

Authors :
Postek, Michael T.
Newbury, Dale E.
Platek, S. Frank
Maugel, Tim K.
Villarrubia, J. S.
Vladár, A. E.
Postek, M. T.
Source :
Proceedings of SPIE; October 2014, Vol. 9236 Issue: 1 p923602-923602-12
Publication Year :
2014

Details

Language :
English
ISSN :
0277786X
Volume :
9236
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs34042041
Full Text :
https://doi.org/10.1117/12.2069324