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Across scanner platform optimization to enable EUV lithography at the 10-nm logic node
- Source :
- Proceedings of SPIE; April 2014, Vol. 9048 Issue: 1 p90481L-90481L-9, 814339p
- Publication Year :
- 2014
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 9048
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs32917065
- Full Text :
- https://doi.org/10.1117/12.2048314