A two-dimensional B implantation model for semiconductor process simulation environments

Details

Language :

English

ISSN :

0168583X

Volume :

79

Issue :

1

Database :

Supplemental Index

Journal :

Nuclear Instruments and Methods in Physics Research Section B

Publication Type :

Periodical

Accession number :

ejs2951856

Full Text :

https://doi.org/10.1016/0168-583X(93)95435-8