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Investigation of the plasma treatment in a multistep TiN MOCVD process
- Source :
- Microelectronic Engineering; 2000, Vol. 50 Issue: 1 p533-540, 8p
- Publication Year :
- 2000
Details
- Language :
- English
- ISSN :
- 01679317
- Volume :
- 50
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Microelectronic Engineering
- Publication Type :
- Periodical
- Accession number :
- ejs2932128
- Full Text :
- https://doi.org/10.1016/S0167-9317(99)00324-X