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Cost-effective large-scale fabrication of diffractive optical elements by using conventional semiconducting processes

Authors :
Yoo, Seunghwan
Song, Ho Young
Lee, Junghoon
Jang, Cheol-Yong
Jeong, Hakgeun
Source :
Applied Optics; November 2012, Vol. 51 Issue: 33 p8052-8056, 5p
Publication Year :
2012

Abstract

In this article, we introduce a simple fabrication method for SiO_2-based thin diffractive optical elements (DOEs) that uses the conventional processes widely used in the semiconductor industry. Photolithography and an inductively coupled plasma etching technique are easy and cost-effective methods for fabricating subnanometer-scale and thin DOEs with a refractive index of 1.45, based on SiO_2. After fabricating DOEs, we confirmed the shape of the output light emitted from the laser diode light source and applied to a light-emitting diode (LED) module. The results represent a new approach to mass-produce DOEs and realize a high-brightness LED module.

Details

Language :
English
ISSN :
1559128X and 21553165
Volume :
51
Issue :
33
Database :
Supplemental Index
Journal :
Applied Optics
Publication Type :
Periodical
Accession number :
ejs29069208