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A new lifetime prediction method for hot-carrier degradation in n-MOSFETs with ultrathin gate oxides under Vg=Vd

Authors :
Mu, F.
Xu, M.
Tan, C.
Duan, X.
Source :
Microelectronics Reliability; 2001, Vol. 41 Issue: 11 p1909-1913, 5p
Publication Year :
2001

Details

Language :
English
ISSN :
00262714
Volume :
41
Issue :
11
Database :
Supplemental Index
Journal :
Microelectronics Reliability
Publication Type :
Periodical
Accession number :
ejs2662976
Full Text :
https://doi.org/10.1016/S0026-2714(01)00118-4