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Oxide thickness dependence of plasma charging damage

Authors :
Lin, H.-C.
Chen, C.-C.
Wang, M.-F.
Hsien, S.-K.
Chien, C.-H.
Huang, T.-Y.
Chang, C.-Y.
Source :
Microelectronics Reliability; 1999, Vol. 39 Issue: 3 p357-364, 8p
Publication Year :
1999

Details

Language :
English
ISSN :
00262714
Volume :
39
Issue :
3
Database :
Supplemental Index
Journal :
Microelectronics Reliability
Publication Type :
Periodical
Accession number :
ejs2662510
Full Text :
https://doi.org/10.1016/S0026-2714(98)00247-9