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Oxygen concentration in Czochralski silicon crystals depending on silicon monoxide evaporation from boron doped silicon melts

Authors :
Maeda, S.
Abe, K.
Kato, M.
Nakanishi, H.
Hoshikawa, K.
Terashima, K.
Source :
Journal of Crystal Growth; 1998, Vol. 192 Issue: 1 p117-124, 8p
Publication Year :
1998

Details

Language :
English
ISSN :
00220248
Volume :
192
Issue :
1
Database :
Supplemental Index
Journal :
Journal of Crystal Growth
Publication Type :
Periodical
Accession number :
ejs2576337
Full Text :
https://doi.org/10.1016/S0022-0248(98)00375-3