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Incorporation kinetics of rare earth impurities in Si during molecular beam epitaxy
- Source :
- Journal of Crystal Growth; 1995, Vol. 157 Issue: 1 p333-337, 5p
- Publication Year :
- 1995
Details
- Language :
- English
- ISSN :
- 00220248
- Volume :
- 157
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Journal of Crystal Growth
- Publication Type :
- Periodical
- Accession number :
- ejs2573136
- Full Text :
- https://doi.org/10.1016/0022-0248(95)00415-7