Low pressure chemical vapour deposition of polycrystalline silicon: validation and assessment of reactor models

Details

Language :

English

ISSN :

00092509

Volume :

51

Issue :

10

Database :

Supplemental Index

Journal :

Chemical Engineering Science

Publication Type :

Periodical

Accession number :

ejs2434722

Full Text :

https://doi.org/10.1016/0009-2509(96)00068-1