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Xenon Discharge-Produced Plasma Radiation Source for EUV Lithography

Authors :
Zhang, C H
Lv, P
Zhao, Y P
Wang, Q
Katsuki, S
Namihira, T
Horta, H
Imamura, H
Kondo, Y
Akiyama, H
Source :
IEEE Transactions on Industry Applications; 1974, Vol. 10 Issue: 4 p1661-1666, 6p
Publication Year :
1974

Details

Language :
English
ISSN :
00939994
Volume :
10
Issue :
4
Database :
Supplemental Index
Journal :
IEEE Transactions on Industry Applications
Publication Type :
Periodical
Accession number :
ejs21801091
Full Text :
https://doi.org/10.1109/TIA.2010.2051059