Back to Search
Start Over
Plasma Polymerization of Thin Films: Correlations between Plasma Chemistry and Thin Film Character
- Source :
- Langmuir; May 2002, Vol. 18 Issue: 10 p4118-4123, 6p
- Publication Year :
- 2002
-
Abstract
- Organic thin films were deposited by plasma-enhanced chemical vapor deposition, using isopropyl alcohol as a precursor. The pulsed, inductively coupled plasma was characterized with in situ Langmuir probe measurements and mass spectrometry. We identify the key ionized species diffusing to the substrate and offer explanations as to how they are generated. The films were analyzed with X-ray photoelectron spectroscopy. Correlations were observed between the plasma ion mass distributions and the oxidation state of the deposited carbon.
Details
- Language :
- English
- ISSN :
- 07437463 and 15205827
- Volume :
- 18
- Issue :
- 10
- Database :
- Supplemental Index
- Journal :
- Langmuir
- Publication Type :
- Periodical
- Accession number :
- ejs2173679
- Full Text :
- https://doi.org/10.1021/la011566j