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Deep Level near EC – 0.55 eV in Undoped 4H-SiC Substrates

Authors :
Mitchel, W.C.
Mitchell, William D.
Smith, S.R.
Landis, G.R.
Evwaraye, A.O.
Fang, Z.Q.
Look, David C.
Sizelove, J.R.
Source :
Materials Science Forum; October 2006, Vol. 527 Issue: 1 p505-508, 4p
Publication Year :
2006

Abstract

A variety of 4H-SiC samples from undoped crystals grown by the physical vapor transport technique have been studied by temperature dependent Hall effect, optical and thermal admittance spectroscopy and thermally stimulated current. In most samples studied the activation energies were in the range 0.9 - 1.6 eV expected for commercial grade HPSI 4H-SiC. However, in several samples from developmental crystals a previously unreported deep level at EC-0.55 ± 0.01 eV was observed. Thermal admittance spectroscopy detected one level with an energy of about 0.53 eV while optical admittance spectroscopy measurements resolved two levels at 0.56 and 0.64 eV. Thermally stimulated current measurements made to study compensated levels in the material detected several peaks at energies in the range 0.2 to 0.6 eV.

Details

Language :
English
ISSN :
02555476 and 16629752
Volume :
527
Issue :
1
Database :
Supplemental Index
Journal :
Materials Science Forum
Publication Type :
Periodical
Accession number :
ejs20111490
Full Text :
https://doi.org/10.4028/www.scientific.net/MSF.527-529.505