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The Development of Resistive Heating for the High Temperature Growth of α-SiC using a Vertical CVD Reactor
- Source :
- Materials Science Forum; May 2000, Vol. 338 Issue: 1 p157-160, 4p
- Publication Year :
- 2000
-
Abstract
- Not Available
Details
- Language :
- English
- ISSN :
- 02555476 and 16629752
- Volume :
- 338
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Materials Science Forum
- Publication Type :
- Periodical
- Accession number :
- ejs20091766
- Full Text :
- https://doi.org/10.4028/www.scientific.net/MSF.338-342.157