Evolution of structural and physical properties upon annealing of sputter-deposited Zr0.84Y0.16-O2 films incorporating copper and palladium nanoparticles

Me-incorporated Zr0.84Y0.16 oxide thin films (Me: Cu or Pd) were synthesized by magnetron co-sputtering. The film structural evolution due to metal content increase was shown: Me-doped nanocrystalline yttria stabilized zirconia (YSZ); Me-doped amorphous oxide; metal nanoparticles embedded in the amorphous oxide matrix. Annealing for 2 h at 300degC in air promoted copper oxide formation and the segregation of very fine Pd particles. XANES analysis at the Cu-K edge showed that Cu is bonded to oxygen and Zr(Y) in Cu-doped amorphous oxide; this state was not affected by the thermal treatment. XANES and resistivity analyses indicated that the Cu nanoparticles likely have oxidized surfaces while the Pd-containing films showed only minor chemical changes after annealing.