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Ultra-small MOSFETs: The Importance of the Full Coulomb Interaction on Device Characteristics

Authors :
J. Gross, W.
Vasileska, D.
K. Ferry, D.
Source :
VLSI Design; 2001, Vol. 13 Issue: 1
Publication Year :
2001

Abstract

We discuss a full three-dimensional model of an ultra-small MOSFET, in which the transport is treated by a coupled EMC and molecular dynamics (MD) procedure to treat the Coulomb interaction in real space. The inclusion of the proper Coulomb interaction affects both the energy and momentum relaxation processes, but also has a dramatic effect on the characteristic curves of the device. We find that the short-range e–e and e–i terms, combined with discrete impurity effects, is also needed for accurate measurement of the device threshold voltage.

Details

Language :
English
ISSN :
1065514X and 15635171
Volume :
13
Issue :
1
Database :
Supplemental Index
Journal :
VLSI Design
Publication Type :
Periodical
Accession number :
ejs18881063
Full Text :
https://doi.org/10.1155/2001/78780