119Sn Mössbauer study of the implantation behaviour of119In,119Sn,119mSn,119Sb and119mTe ions in SiC

The implantation behaviour of stable¹¹⁹Sn⁺ ions and radioactive¹¹⁹In⁺,^119mSn⁺,¹¹⁹Sb⁺ and^119mTe⁺ ions in SiC has been investigated by, respectively, conversion-electron Mössbauer spectroscopy on the 24 keV transition of¹¹⁹Sn, and by Mössbauer emission spectroscopy on the 24 keVγ radiation emitted by the¹¹⁹Sn daughter after the decays of the radioactive isotopes. The Mössbauer spectra could be decomposed in most cases into two groups of lines, one originating from¹¹⁹Sn atoms on substitutional Si sites, the other from various Sn-vacancy complexes distinguished by their Mössbauer parameters. Annealing experiments reveal a strong dependence of the structure of the defects and the formation and annealing kinetics on the chemical nature of the impurities. Defects formed in 297 K implantations with^119mSn and¹¹⁹Sb anneal above 500 ‡C, resulting in a preferential location of the impurities on substitutional Si sites, whereas^119mTe atoms are efficient defect-trapping centres and no stable, substitutional fraction is observed on either lattice site. Possible structures for the Sn-vacancy complexes are discussed and comparison is made to similar defect complexes in group IV and in III–V semiconductors.