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Deposition of PbTiO3 film by the spray-ICP technique
- Source :
- Journal of Materials Science; October 1994, Vol. 29 Issue: 19 p5109-5114, 6p
- Publication Year :
- 1994
-
Abstract
- PbTiO<subscript>3</subscript> thin films were prepared on various substrates by spraying an ultrasonically atomized aqueous solution of Pb(NO<subscript>3</subscript>)<subscript>2</subscript> + TiO (NO<subscript>3</subscript>)<subscript>2</subscript> into an inductively coupled plasma (ICP) under atmospheric pressure. Single-phase PbTiO<subscript>3</subscript> with perovskite structure was obtained at 500–650 °C. The perovskite obtained below 600 °C showed less tetragonality due to the effect of grain size. The PbTiO<subscript>3</subscript> films crystallized with preferred (1 1 1) and (0 0 1) orientations on sapphire (0 0 1) and MgO (1 0 0), respectively. Based on the analysis of ICP emission spectra, it is suggested that a reoxidation of titanium preceded that of lead in the plasma, and also that OH in the plasma played an important role in the deposition of PbTiO<subscript>3</subscript>.
Details
- Language :
- English
- ISSN :
- 00222461 and 15734803
- Volume :
- 29
- Issue :
- 19
- Database :
- Supplemental Index
- Journal :
- Journal of Materials Science
- Publication Type :
- Periodical
- Accession number :
- ejs16423683
- Full Text :
- https://doi.org/10.1007/BF01151104