Back to Search
Start Over
Phenomenology of picosecond heating and evaporation of silicon surfaces coated with SiO2 layers
- Source :
- Applied Physics A: Materials Science & Processing; May 1984, Vol. 34 Issue: 1 p25-29, 5p
- Publication Year :
- 1984
-
Abstract
- Picosecond time-resolved reflectivity measurements on bare silicon surfaces and silicon surfaces with oxide layers reveal very fast heat diffusion and material evaporation on subnanosecond time scales. With a thick oxide layer resolidification of a molten silicon surface can take place in a few hundred picoseconds. At high laser fluences, vaporization processes take only a couple of 100 ps.
Details
- Language :
- English
- ISSN :
- 09478396 and 14320630
- Volume :
- 34
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Applied Physics A: Materials Science & Processing
- Publication Type :
- Periodical
- Accession number :
- ejs15638059
- Full Text :
- https://doi.org/10.1007/BF00617570