Effects of O2/N2O-plasma treatment on nitride films on strained Si

Details

Language :

English

ISSN :

00381101

Volume :

44

Issue :

9

Database :

Supplemental Index

Journal :

Solid State Electronics

Publication Type :

Periodical

Accession number :

ejs12404912

Full Text :

https://doi.org/10.1016/S0038-1101(00)00134-9