A KineticAnalysis of the Growth and Doping Kineticsof the SiC Chemical Vapor Deposition Process.

Details

Language :

English

ISSN :

08885885

Volume :

53

Issue :

22

Database :

Supplemental Index

Journal :

Industrial & Engineering Chemistry Research

Publication Type :

Academic Journal

Accession number :

96517378

Full Text :

https://doi.org/10.1021/ie403907w