Growth of RuO2Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4Precursor and 5% H2Reduction Gas.

Details

Language :

English

ISSN :

08974756

Volume :

22

Issue :

20

Database :

Supplemental Index

Journal :

Chemistry of Materials

Publication Type :

Academic Journal

Accession number :

54844116

Full Text :

https://doi.org/10.1021/cm101694g